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PVD for Microelectronics: Sputter Desposition to Semiconductor Ma: PVD for Microelectronics Vol 26 (Physics of Thin Films) [Hardcover] Review
GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one with the longest running continuing series in thin film science, composed of 25 volumes since 1963. The series contains quality studies in the properties of various thin films materials and systems. In order to be in a posture to reflect the introduction of today's science and to cover all modern aspects of thin films, the series, beginning with Volume 20, has moved at night basic physics of thin films. It now addresses probably the most important areas of both inorganic and organic thin films, in the their theoretical also as technological aspects. Therefore, as a way to reflect the present day technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, may be wholly written by two authors instead of showcasing several edited manuscripts.
Ronald A. Powell. Palo Alto, California. Novellus Systems, Inc., Palo Alto California - Stephen M. Rossnagel. Yorktown Heights, New York. IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York
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